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Semiconductors
Reliable and precise analyzers are needed to meet the stringent quality parameters needed to produce advanced semiconductors and optoelectronics
The production of semiconductors requires high quality standards to eliminate trace contaminants, a primary cause of wafer defects. Monitoring the water purity, acids in etching baths, metals content in plating baths, or ionic impurities is crucial to optimize semiconductor production efficiency and increase yield.
Trace analysis presents special challenges to measuring devices and analytical methods. Matrix effects are usually intensified by the low concentration of the analytes. Metrohm offers integrated sample preparation, such as pre-concentration or matrix elimination, for the most accurate results.
Metrohm offers top-quality analytical instruments for both laboratory and process stream applications, ensuring precise and reliable analysis from monitoring bath compositions to detecting impurities and more. You can also rely on our expertise and first-class, on-site service to support and enhance your semiconductor production.
Discover our latest solutions for your analysis
Automated CVS method development and optimization of multicomponent plating baths
Download this White Paper to learn more about how to optimize CVS methods for the analysis of electroplating copper baths.
Products
Metrohm supports every step of the semiconductor manufacturing process with robust, high-accuracy analytical solutions for trace ion analysis, metallic contamination, etching and plating baths, and more.
Professional CVS
Flexibilní stolní analyzátory pro cyklické voltametrické rozpouštění.
OMNIS Titrace
Připravte se na budoucnost titrace: rychlejší výsledky, bezpečnější manipulace s chemikáliemi a snadnější přizpůsobení vašim požadavkům.
940 Professional IC Vario
Jeden přístroj – maximální flexibilita: Iontový chromatograf prakticky bez omezení individuální konfigurace systému a přizpůsobení.
- WP-097Why switch to OMNIS Client/Server (C/S)?
OMNIS Client/Server boosts business performance with scalable server management, cutting costs by reducing hardware, energy use, and maintenance across locations.
- AN-EIS-004Electrochemical Impedance Spectroscopy (EIS) Part 4 – Equivalent Circuit Models
Explore how to construct simple and complex equivalent circuit models for fitting EIS data in this Application Note. Nyquist plots are shown for each example.
- AN-V-238Bismuth stabilizer in an electroless Ni plating bath
Electroless Ni plating offers superior surface finish and corrosion resistance. Anodic stripping voltammetry allows Bi stabilizer to be monitored in Ni plating baths.
- AN-V-237Lead stabilizer in an electroless Ni plating bath
Electroless nickel plating ensures low-cost wear and corrosion resistance. Monitoring lead stabilizer levels in Ni plating baths is possible with the Bi drop electrode.
- AN-V-236Antimony stabilizer in an electroless Ni bath
Monitoring Sb(III) stabilizer levels during electroless Ni plating is critical for high-quality coatings. Anodic stripping voltammetry offers fast, reliable Sb(III) analysis.
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