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Semiconductors
Reliable and precise analyzers are needed to meet the stringent quality parameters needed to produce advanced semiconductors and optoelectronics
The production of semiconductors requires high quality standards to eliminate trace contaminants, a primary cause of wafer defects. Monitoring the water purity, acids in etching baths, metals content in plating baths, or ionic impurities is crucial to optimize semiconductor production efficiency and increase yield.
Trace analysis presents special challenges to measuring devices and analytical methods. Matrix effects are usually intensified by the low concentration of the analytes. Metrohm offers integrated sample preparation, such as pre-concentration or matrix elimination, for the most accurate results.
Metrohm offers top-quality analytical instruments for both laboratory and process stream applications, ensuring precise and reliable analysis from monitoring bath compositions to detecting impurities and more. You can also rely on our expertise and first-class, on-site service to support and enhance your semiconductor production.
Discover our latest solutions for your analysis
Automated CVS method development and optimization of multicomponent plating baths
Download this White Paper to learn more about how to optimize CVS methods for the analysis of electroplating copper baths.
Products
Metrohm supports every step of the semiconductor manufacturing process with robust, high-accuracy analytical solutions for trace ion analysis, metallic contamination, etching and plating baths, and more.
Professional CVS
Flexible benchtop analyzers for Cyclic Voltammetric Stripping.
OMNIS titrators
All-in-one potentiometric autotitrator platform: faster results, safer handling of chemicals, and maximum modularity for easier adaptability to your requirements.
940 Professional IC Vario
가장 유연한 모듈식 이온크로마토그래피 시스템: 2채널 동시 분석부터 다양한 옵션까지, 사용자 맞춤형으로 제한 없이 구성할 수 있습니다.
- WP-097Why switch to OMNIS Client/Server (C/S)?
OMNIS Client/Server boosts business performance with scalable server management, cutting costs by reducing hardware, energy use, and maintenance across locations.
- AN-EIS-004Electrochemical Impedance Spectroscopy (EIS) Part 4 – Equivalent Circuit Models
Explore how to construct simple and complex equivalent circuit models for fitting EIS data in this Application Note. Nyquist plots are shown for each example.
- AN-V-237Lead stabilizer in an electroless Ni plating bath
Electroless nickel plating ensures low-cost wear and corrosion resistance. Monitoring lead stabilizer levels in Ni plating baths is possible with the Bi drop electrode.
- AN-V-238Bismuth stabilizer in an electroless Ni plating bath
Electroless Ni plating offers superior surface finish and corrosion resistance. Anodic stripping voltammetry allows Bi stabilizer to be monitored in Ni plating baths.
- AN-V-236Antimony stabilizer in an electroless Ni bath
Monitoring Sb(III) stabilizer levels during electroless Ni plating is critical for high-quality coatings. Anodic stripping voltammetry offers fast, reliable Sb(III) analysis.
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