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Semiconductors
Reliable and precise analyzers are needed to meet the stringent quality parameters needed to produce advanced semiconductors and optoelectronics
The production of semiconductors requires high quality standards to eliminate trace contaminants, a primary cause of wafer defects. Monitoring the water purity, acids in etching baths, metals content in plating baths, or ionic impurities is crucial to optimize semiconductor production efficiency and increase yield.
Trace analysis presents special challenges to measuring devices and analytical methods. Matrix effects are usually intensified by the low concentration of the analytes. Metrohm offers integrated sample preparation, such as pre-concentration or matrix elimination, for the most accurate results.
Metrohm offers top-quality analytical instruments for both laboratory and process stream applications, ensuring precise and reliable analysis from monitoring bath compositions to detecting impurities and more. You can also rely on our expertise and first-class, on-site service to support and enhance your semiconductor production.
Discover our latest solutions for your analysis
Automated CVS method development and optimization of multicomponent plating baths
Download this White Paper to learn more about how to optimize CVS methods for the analysis of electroplating copper baths.
Products
Metrohm supports every step of the semiconductor manufacturing process with robust, high-accuracy analytical solutions for trace ion analysis, metallic contamination, etching and plating baths, and more.
- WP-097Why switch to OMNIS Client/Server (C/S)?
OMNIS Client/Server boosts business performance with scalable server management, cutting costs by reducing hardware, energy use, and maintenance across locations.
- AN-V-199Voltammetric determination of gold(I) in gold plating baths
Controlling Au(I) levels in gold plating baths is required for high quality. Voltammetric analysis with the Multi-Mode Electrode Pro is an efficient solution.
- AN-EIS-004Electrochemical Impedance Spectroscopy (EIS) Part 4 – Equivalent Circuit Models
Explore how to construct simple and complex equivalent circuit models for fitting EIS data in this Application Note. Nyquist plots are shown for each example.
- AN-EIS-003Electrochemical Impedance Spectroscopy (EIS) Part 3 – Data Analysis
Here, the most common circuit elements for EIS are introduced which may be assembled in different configurations to obtain equivalent circuits used for data analysis.
- AN-EIS-009Mott-Schottky Analysis
This Application Note presents the Mott-Schottky measurement, an extension of electrochemical impedance spectroscopy (EIS), on a popular semiconducting material.
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