Cyclic Voltammetric Stripping applications
Cyclic voltammetric stripping (CVS) is an electrochemical technique used for analyzing the content of organic additives in plating baths. Our experts have compiled various application documents on CVS applications for different additives.
- AN-PAN-1067Online analysis of organic additives in copper plating process
Monitoring organic additives in copper plating baths is crucial. The 2060 CVS Process Analyzer optimizes copper electroplating by providing precise bath control.
- AN-V-145Suppressor «Solderon ST-200 Primary» (Rohm and Haas) in a tin bath
Determination of suppressor «Solderon ST-200 Primary» in a tin bath by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-137Suppressor «Cupraspeed» (Atotech) in acid copper bath
Determination of suppressor «Cupraspeed» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-202Determination of suppressor in acid copper baths by smartDT
The determination of suppressor with dilution titration (DT) involves numerous additions with standard solution or sample to reach the evaluation ratio. Usually fixed, equidistant addition volumes are used. With smartDT, variable addition volumes are used that are automatically calculated by the software. At the beginning, the volumes are bigger. Towards the evaluation ratio, the addition volume becomes smaller to guarantee a good accuracy of the result. The operator defines the first and the smallest addition volume to be used. All volumes in between are calculated by the software considering the progress of the determination. Using smartDT with intelligent addition volumes, the determination of suppressor can be significantly accelerated with the same or even better accuracy than with the classic DT. The time saving per determination is between 20 and 40%.
- AN-V-182Suppressor «Top Lucina a-M» (Okuno Chemical Industries) in acid copper bath
Determination of suppressor «Top Lucina α-M» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-141Suppressor «MACuSpec PPR 100 Wetter» Wetter (MacDermid) in acid copper bath
Determination of suppressor «MACuSpecTM PPR 100 Wetter» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-133Suppressor «Copper Gleam 2001 Carrier» (Rohm and Haas) in acid copper bath
Determination of suppressor «Copper GleamTM 2001 Carrier» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-184Leveler «Top Lucina a-3» (Okuno Chemical Industries) in acid Cu bath
Determination of leveler «Top Lucina α-3» in acid copper baths by response curve technique (RC) using cyclic voltammetric stripping (CVS).
- AN-V-156Brightener «Thrucup EVF-1A» (Uyemura) in acid copper bath
Determination of brightener «Thru-Cup EVF-1A» in acid copper baths by modified linear approximation technique (MLAT) using cyclic voltammetric stripping (CVS).
- AN-V-147Brightener «InPulse H6» (Atotech) in acid copper bath
Determination of brightener «InPulse H6» in acid copper baths by modified linear approximation technique (MLAT) using cyclic pulse voltammetric stripping (CPVS).
- AN-V-143Suppressor «Multibond 100 Part A20» (MacDermid) in acid copper bath
Determination of suppressor «MultiBondTM 100 Part A20» in an acid copper bath by dilution titration (DT) using cyclicvoltammetric stripping (CVS).
- AN-V-135Suppressor «Cupracid BL-CT» (Atotech) in acid copper bath
Determination of suppressor «Cupracid BL-CT» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-183Brightener «Top Lucina a-2» (Okuno Chemical Industries) in acid Cu bath
Determination of brightener «Top Lucina α-2» in acid copper baths by modified linear approximation technique (MLAT) using cyclic voltammetric stripping (CVS).
- AN-V-157Leveler «Thru-Cup EVF-R» (Uyemura) in acid copper bath
Determination of leveler «Thru-Cup EVF-R» in acid copper baths by response curve technique (RC) using cyclic voltammetric stripping (CVS).
- AN-V-155Suppressor «Thrucup EVF-B» (Uyemura) in acid copper bath
Determination of suppressor «Thru-Cup EVF-B» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-146Suppressor «InPulse H6» (Atotech) in acid copper bath
Determination of suppressor «InPulse H6» in acid copper baths by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-144Suppressor «Ronastan TP» (Rohm and Haas) in tin/lead bath
Determination of suppressor «Ronastan TP Additive» in a tin/lead bath by dilution titration (DT) using cyclic voltammetric stripping (CVS).
- AN-V-142Brightener «MACuSpec PPR 100» (MacDermid) in acid copper bath
Determination of brightener «MACuSpecTM PPR 100 Brightener» in acid copper baths by modified linear approximation technique (MLAT) using cyclic voltammetric stripping (CVS).
- AN-V-138Brightener «Cupraspeed» (Atotech) in acid copper bath
Determination of brightener «Cupraspeed» in acid copper baths by modified linear approximation technique (MLAT)using cyclic voltammetric stripping (CVS).
- AN-V-136Brightener «Cupracid BL» (Atotech) in acid copper bath
Determination of brightener «Cupracid BL» in acid copper baths by linear approximation technique (LAT) using cyclicvoltammetric stripping (CVS).
- AN-V-134Brightener «Copper Gleam 2001 Additive» (Rohm and Haas) in acid copper bath
Determination of brightener «Copper GleamTM 2001 Additive» in acid copper baths by modified linear approximation technique (MLAT) using cyclic voltammetric stripping (CVS).
- AB-420Determination of suppressor with CVS using the calibration technique «smartDT» with dynamic addition volumes
The Application Bulletin describes the determination of suppressor in acid copper baths by smartDT. The determination of suppressor with dilution titration (DT) involves numerous additions with standard solution or sample to reach the evaluation ratio. Usually fixed, equidistant addition volumes are used. With smartDT, variable addition volumes are used that are dynamically calculated by the software. At the beginning, the volumes are bigger. Towards the evaluation ratio, the addition volume becomes smaller to guarantee a good accuracy of the result. The operator defines the first and the smallest addition volume to be used. All volumes in between are calculated by the software considering the progress of the determination. The time saving with smartDT compared to a classic DT with fixed addition volumes can be up to 40%. smartDT is suitable for nonlinear regression and quadratic regression as well as linear interpolation. It can be used for determination of suppressor in acid copper baths as well as in tin and tin-lead baths and works with 1, 2, and 3 mm Pt working electrodes. A 800 Dosino is required for the automatic addition of suppressor standard or sample. The method can also be used in fully automated systems.
- WP-051Automated CVS method development and optimization of multicomponent plating baths
For the past three decades, Cyclic Voltammetric Stripping (CVS) has been the standard practice for analyzing organic additives in electroplating copper baths in the circuit board and wafer plating industries. The variations in the compositions of such baths have created a need for more optimized method development routines. New advancements in the hardware and software protocols for CVS have simplified the overall process of method optimization to a great extent. In this study, the process of method optimization is discussed in conjunction with these protocols.
