电子与半导体

睿曲标定法（brightRC）可实现电镀光亮剂的 CVS/CPVS 定量检测，无需多次添加标准溶液，对于信号呈现非线性特征的添加剂体系同样适用。该功能采用外置响应曲线校准与灵活回归算法，能够规避线性标准添加法存在的系统偏差，有效缩短分析时长，适用于工况稳定的镀铜槽液高通量常规检测场景。

OMNIS客户端/服务器架构通过可扩展的服务器管理提升业务绩效，通过减少跨地点的硬件、能源消耗和维护成本来降低运营开支。

This bulletin deals with the automated determination of mixtures of HNO3, HF and H2SiF6 in the range of approximately 200-600 g/L HNO3, 50-160 g/L HF, and 0-185 g/L H2SiF6 using thermometric titration.Etch acid mixtures containing HNO3, HF and H2SiF6 from the etching of silicon substrates can be analyzed in a sequence of two determinations using the 859 Titrotherm. The first determination involves a direct titration with standard c(NaOH) = 2 mol/L, followed by a back titration with c(HCl) = 2 mol/L. This determination yields the H2SiF6 content plus a value for the combined (HNO3+HF) contents. The second determination consists of a titration with c(Al3+) = 0.5 mol/L to determine the HF content. For freshly made up mixtures of HNO3 and HF containing no H2SiF6, a linked two-titration sequence is employed. Results from the two determinations are used by tiamoTM to yield individual results for HNO3, HF and H2SiF6.

使用温度滴定法 (TET) 可轻松测定蚀刻槽中的硝酸、磷酸和醋酸。与电位滴定法相比，TET 更快、更方便。不到两分钟即可完成分析。

控制镀金液中金（I）的含量是保证高质量的必要条件。使用多模式电极 Pro 进行伏安分析是一种有效的解决方案。