電子 & 半導體

OMNIS客户端/服务器架构通过可扩展的服务器管理提升业务绩效，通过减少跨地点的硬件、能源消耗和维护成本来降低运营开支。

This bulletin deals with the automated determination of mixtures of HNO3, HF and H2SiF6 in the range of approximately 200-600 g/L HNO3, 50-160 g/L HF, and 0-185 g/L H2SiF6 using thermometric titration.Etch acid mixtures containing HNO3, HF and H2SiF6 from the etching of silicon substrates can be analyzed in a sequence of two determinations using the 859 Titrotherm. The first determination involves a direct titration with standard c(NaOH) = 2 mol/L, followed by a back titration with c(HCl) = 2 mol/L. This determination yields the H2SiF6 content plus a value for the combined (HNO3+HF) contents. The second determination consists of a titration with c(Al3+) = 0.5 mol/L to determine the HF content. For freshly made up mixtures of HNO3 and HF containing no H2SiF6, a linked two-titration sequence is employed. Results from the two determinations are used by tiamoTM to yield individual results for HNO3, HF and H2SiF6.

使用温度滴定法 (TET) 可轻松测定蚀刻槽中的硝酸、磷酸和醋酸。与电位滴定法相比，TET 更快、更方便。不到两分钟即可完成分析。

控制镀金液中金（I）的含量是保证高质量的必要条件。使用多模式电极 Pro 进行伏安分析是一种有效的解决方案。

监控镀铜液中的有机添加剂至关重要。2060 CVS 过程分析仪通过提供精确的镀液控制来优化电镀铜过程。