Determination of hydrofluoric acid in silicon etch solutions
AN-H-098
pt_BR
This Application Note describes the determination of fluoride in silicon etch solutions with thermometric titration.
The semiconductor industry relies on silicon wafers which must first be processed via mechanical and chemical means. Wet etching is a chemical treatment used to form structures in the silicon using a strong acid or mixture of acids. Acid etching solutions often contain hydrofluoric acid (HF) due to its high etch rate. Determination of fluoride in silicon etch solutions is possible with thermometric titration, as described in this Application Note.