Produits métalliques, placage et finition

This document outlines complexometric and potentiometric determination of metal ions via EDTA titration using a copper-selective electrode (Cu-ISE) with a durable epoxy shaft and crystal membrane. Because the electrode is insensitive to complexing agents, a preformed Cu–metal complex must be introduced into the sample prior to analysis. The method, applicable to direct or back-titration, exploits EDTA–metal formation constants to define equivalence points and enables quantification in several different matrices.

Purity of rare earth elements (REEs) can be determined by absolute complexometric titration with xylenol orange (ISO 23597). This approach achieves around 100% recovery, eliminates the need for calibration, and offers higher accuracy and reproducibility than techniques such as AAS (atomic absorption spectroscopy). Photometric titration with the Optrode M2 offers adjustable wavelength detection, providing a fast, precise, and cost-effective alternative to other conventional methods.

Rare earth elements (REEs) are critical materials whose deposit viability and processing streams require accurate mass-fraction determination during ore dissolution and purification. This Application Note describes a rapid potentiometric back-titration using a copper ion-selective electrode (Cu-ISE) that enables selective quantification and partial separation of REEs in complex matrices with near-quantitative recovery. As an absolute, flexible, and cost-effective method with ICP-compatible sample preparation, back-titration is well suited both as a reference technique and for rapid on-site analysis.

brightRC enables reliable CVS (or CPVS) brightener quantification without repeated standard additions, especially for additive systems with nonlinear signal behavior. By using external response curve (RC) calibration and flexible regression, it avoids systematic errors inherent to linear standard addition methods and significantly reduces analysis time. This makes brightRC ideal for high throughput routine control in stable copper plating baths.

Here, the most common circuit elements for EIS are introduced which may be assembled in different configurations to obtain equivalent circuits used for data analysis.