AN-H-100

Determination of total acids in highly acidic etch solutions

Summary

Determination of the total acids concentration in mixtures of nitric-hydrofluoric acid intended for etching silicon substrates.

Download AN-H-100 (EN)

Kontakt

Metrohm Nordic ApS

Lyskær 3C. 1. th.
2730 Herlev

Kontakt

Explore more by industry

Electronics & semiconductors

Energy

2 / 2

Find applikationer

Præcisér din søgning(99)

Denne applikation er tagget under

// Acids – inorganic// Etching baths-pickling baths

Phosphates speciation with Raman spectroscopy

// Acids – inorganic // Education & basic research // Chemical

Determining phosphate concentration with Raman spectroscopy

// Acids – inorganic // Education & basic research // Chemical

Determining the corrosion rate with INTELLO

// Acids – inorganic // Automotive and aerospace // Education & basic research

Inline analysis of borate and sulfate solutions with Raman spectroscopy

// Acids – inorganic // Chemical // Boron, silicon, germanium, arsenic, selenium, antimony, tellurium

2 / 4