Next-Generation Bath Monitoring for Semiconductor Manufacturing

57 min

// Electronics & semiconductor

Watch as Brian Benner, Principal Scientist at Micron, and Elena Hagemann, Product Manager Process Spectroscopy at Metrohm USA, share their perspective on next-generation bath monitoring and the evolving role of Process Analytical Technology (PAT) in semiconductor manufacturing. Learn how industry leaders approach challenges with current NIR monitoring strategies for critical process chemistries and explore why Raman spectroscopy is emerging as a next-generation solution for real-time process monitoring and manufacturing consistency.

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Webinar ID

https://metrohm.scene7.com/is/image/metrohm/semiconductor%20bath?qlt=85&ts=1793391064845&dpr=off

Key learning points

Understand the limitations of NIR Spectroscopy in measuring certain critical bath components
Common challenges in monitoring critical bath chemistries in semiconductor manufacturing
Why semiconductor manufacturers are exploring next-generation approaches to bath monitoring and process control
Why Raman spectroscopy is emerging as a promising technology for next-generation bath monitoring
How Process Analytical Technology (PAT) supports process stability, product quality, and manufacturing yield