Double-tank etch cell setup

Double-tank etch cell setup
Order number: 014RDX

This is a horizontally mounted, double-tank cell typically used for anodization of Si-wafers with electrolyte backside contact. It consists of two polyether ether ketone (PEEK) gas-tight chambers each equipped with sapphire wafer serving as window for illumination allowing light-assisted porous Si formation.

It well fits aqueous (EPDM O-Rings) and organic solvent (FFKM O-Rings) electrolyte requirements. The Si substrate is mounted in between these chambers and sealed with O-rings under magnetic/screw mount. The preparation of a whole porous Si substrate with this cell is possible at one simple etching step, assuring high reproducibility.