Tetramethylammonium hydroxide (TMAH) in photoresist developers

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The chemicals used in the manufacture of semiconductors must exhibit an exceptional purity, because even traces of contaminants have a negative effect on electrical properties. For the manufacture of printed circuit boards, the light-sensitive photoresist applied to the substrate (wafer) is exposed to light at defined areas with the aid of a photo template and then developed in a chemical reaction. The developer contains 2.38 to 2.62% tetramethylammonium hydroxide (TMAH) and ensures that the exposed areas can be readily separated from the substrate.

The monitoring of the TMAH concentration in the developer solution takes place with a process analyzer from Metrohm Applikon that is configured specially for titration. In addition to this, the analyzer helps with the mixing of the TMAH solutions.